منابع مشابه
Patterning of polymer brushes made easy using titanium dioxide: direct and remote photocatalytic lithography.
Photocatalytic lithography is proved for the realization of micropatterned polymer brushes. Initiator-functionalized titanium dioxide or silicon surfaces are respectively exposed directly to near-UV light through a photomask (direct approach) or through a transparent photoactive TiO2 film (remote approach). Initiator patterns are then amplified as polymer brushes with SI-ATRP. Features down to ...
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INTRODUCTION The demand for the practical use of the nanoimprint lithography (NIL) has risen for the miniaturization in two-dimensional micro/nano fabrication technology. Photolithography is now used widely, however, has a few of difficulties such as the high equipment cost and the diffraction limit. NIL, in which a resist on a substrate is patterned by mechanical pressing a nanostructured mold...
متن کاملEUV Lithography—The Successor to Optical Lithography?
This paper discusses the basic concepts and current state of development of EUV lithography (EUVL), a relatively new form of lithography that uses extreme ultraviolet (EUV) radiation with a wavelength in the range of 10 to 14 nanometer (nm) to carry out projection imaging. Currently, and for the last several decades, optical projection lithography has been the lithographic technique used in the...
متن کاملNanoimprint lithography
Nowadays, nanodevices like small fluidic channels, semiconductor lasers, nano contacts for solar cells, nano magnets or nano antennas for infrared detection (THz) are of great interest. The applications for these devices extend the fields of e.g. energy, computational or medical sciences. For example, by arranging nano dots consisting of a magnetic material, logical circuits can be designed whi...
متن کاملNanoimprint Lithography
The Nanoimprint lithography (NIL) is a novel method of fabricating micro/nanometer scale patterns with low cost, high throughput and high resolution (Chou et al., 1996). Unlike traditionally optical lithographic approaches, which create pattern through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the...
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ژورنال
عنوان ژورنال: Applied Sciences
سال: 2019
ISSN: 2076-3417
DOI: 10.3390/app9071266